We are delighted to be part of SEMICON Japan again this year! From December 17 to 19, 2025, we will be exhibiting at the SAXONY! community booth at the Tokyo Big Sight Convention Center (West Hall, Booth W1007).

Visit us and learn more about our sustainable solutions for clean air and clean water in the semiconductor industry. Together with our partners from Saxony, we will demonstrate how innovative environmental technologies contribute to the future viability of global chip production.

We look forward to meeting you in Tokyo!

Product highlights at a glance:

• SALIX: SALIX was specially developed for the requirements of wet chemical cleaning processes (wet clean technology) in the semiconductor industry. The scrubber system reliably removes isopropyl alcohol (IPA), ammonia, and hydrogen fluoride from the exhaust gas streams of modern single wafer clean systems, among other things.
• OTTELIA: The innovative wastewater treatment plant removes silicon dioxide particles (SiO2) at the point of use, which are produced in particular during wet chemical cleaning and etching processes in semiconductor manufacturing.

Take advantage of this opportunity and come by.