TSUGA – Bay Solution with Multifunctionality

TSUGA is the stand-alone solution for secondary waste gas treatment of NOx and particulate matter in the semiconductor industry.

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TSUGA – Secondary Waste Gas Treatment of NOx and Particulate Matter

DAS EE‘s Catalytic Systems represent an advanced solution for the semiconductor industry, offering superior performance in waste gas aftertreatment by harnessing the power of Selective Catalytic Reduction (SCR) with ammonia for DeNOx and fine dust removal through a highly efficient membrane filter. The catalytic system ensures exceptional reduction efficiency with minimal energy consumption by recovery of more than 80% of the process heat. With the advanced, reliable, and environmentally friendly solution, you can stay ahead of environmental regulations and achieve your sustainability goals.

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NOx Reduction in the Semiconductor Industry: Innovative Solutions for Waste Gas Treatment

How are nitrogen oxides (NOx) formed, what impact do they have on the environment, and how can TSUGA help reduce NOx and particle emissions? Find out more in the following video.

Optimise Your Waste Gas Treatment with TSUGA

Our catalytic systems as a highly efficient secondary waste gas treatment downstream of NOx-generating burn-wet or plasma-wet abatement systems. 

TSUGA – Technical Data and Configuration Options

A detailed diagram of the TSUGA shows various components such as heat exchangers, filter units, ammonia boxes and safety valves connected by pipes to illustrate the refrigerant cycle; important technical details are marked with clear labels and arrows showing the flow of the process.

TSUGA

TSUGA combines selective catalytic reduction (SCR) with ammonia for highly effective NOx reduction of up to 95% and a membrane filter for almost complete removal of particulate matter (up to 99.9%). The system is characterised by low energy consumption thanks to heat recovery and flexible operation at high volume flows without affecting upstream systems.

Selective catalytic reduction (SCR) converts NOx into harmless nitrogen and water through a catalytic reaction with ammonia. The process achieves high reduction efficiency regardless of the NOx source. SCR enables flexible application for NO and NO2 with low energy consumption and minimal NH3 emissions through precise dosing. Influencing factors include reagent type, mixing ratio, temperature and potential catalyst poisoning (e.g. by SO2, SO3, HF, heavy metals).

Your contact for TSUGA Systems

Do you have questions about TSUGA or would you like to learn more about tailor-made solutions for your use case?

Our team of experts will be happy to advise you on technology, configuration and possible applications.

Preston Nance

General Manager DAS United States

Contact now