Burn-Wet Systems for Waste Gas Treatment
The combination of the two operating procedures burning & scrubbing in the smallest possible space allows a safe treatment of waste gases at the point-of-use.
Waste Gas Treatment in the Semiconductor Industry
The burn-wet technology is applied in a variety of DAS abatement systems treating different dangerous and harmful waste gases. In the semiconductor industry for example fluorine-compounds, ammonia, silane or hydrogen are used. Our compact solutions have a small footprint and are easy to maintain. Operation costs and general safety can be optimised with a process tool interface.
Burn-Wet Technology for Safe Waste Gas Treatment
The compact burn-wet combination from DAS Environmental Experts is based on decades of experience in waste gas treatment. Process gases are oxidised, reduced or pyrolysed in a reactor with a burner, depending on their composition. Subsequent wet scrubbing reliably cools and binds the resulting compounds. Depending on the DAS abatement system, the process design may differ.
This point-of-use technology enables the safe and efficient treatment of industrial waste gases – including those containing fluorine compounds, ammonia, silane or hydrogen – and is used worldwide in the semiconductor industry.
STYRAX – Waste Gas Treatment for Waste Gases from Demanding CVD Processes
The STYRAX product family was specifically developed to manage demanding waste processes like CVD processes in the semiconductor and photovoltaic industry. Our application specialists configure the system, which is available as a burn-wet or plasma-wet system, to meet customer-specific requirements. In this way, media consumption can be adopted flexibly.
TILIA – Dual Reactor System with Internal Redundancy
TILIA is a compact solution for safely disposing of pyrophoric, fluorinated and toxic process gases in the semiconductor and solar industries. Its combination of combustion and wet scrubbing achieves maximum separation efficiency. Find out how TILIA could replace several of your conventional exhaust gas cleaning systems.
Beyond Industry Benchmarks: >99.9% DRE for CF4
The semiconductor industry is under increasing pressure to reduce direct greenhouse gas emissions. Tetrafluoromethane (CF₄) is particularly critical due to its high global warming potential and long atmospheric lifetime.
Destruction and removal efficiency (DRE) is therefore a strategic factor. While industry standards range from 95% to 99%, achieving >99.9% DRE reduces residual emissions tenfold, making it an important lever for decarbonization and compliance.
CF₄ is highly stable and requires precisely controlled thermal conditions for efficient decomposition. Optimized burn-wet systems such as TILIA are an established solution.
High-efficiency abatement reduces emissions and long-term costs, turning compliance into a strategic advantage.
UPTIMUM – Optimized Waste Gas Treatment for High Tool Availability
The UPTIMUM product line has been designed for higher tool uptime especially in CVD processes in the semiconductor and solar industry. The product name UPTIMUM refers to the term “Uptime“ underlining the high availability of the burn/wet system. The tool can be applied to different applications.
ESCAPE – Our Basic System for Process Waste Gas Treatment
The ESCAPE product line is the basis of our point-of-use burner-scrubber technology which is well-established for more than 25 years on the market. Gas Scrubber (burn/wet) offers flexible and customised applications for the abatement of almost all process waste gases in the semiconductor industry. Media supply is variable.
