Point-of-Use Waste Gas Treatment with ESCAPE DUO (Burn-Wet)
Compact high-performance system for semiconductor processes
ESCAPE DUO – Modular Burn-Wet Systems for Safe and Efficient Process Gas Cleaning
Treatment of Waste Gases
The ESCAPE product line is the basis of our point-of-use burn-wet technology, which has been proven on the market for more than 25 years. The waste gas abatement system is used very flexibly and customised to clean almost all process gases generated in the semiconductor industry.
The space-saving systems are also easy to maintain without special tools! The media supply can be varied. Optional process coupling increases safety and reduces operating costs – for efficient and reliable waste gas treatment directly at the point of use.
Efficient Treatment of Industrial Processes with ESCAPE DUO
Semiconductor manufacturing involves highly complex, multi-stage production processes. Etching and chemical vapor deposition (CVD) are critical process steps used to precisely structure and build functional layers on wafers. These processes generate process waste gases that must be treated directly at the point of use to ensure safe, reliable, and environmentally responsible operation.
Etch
Etching involves the targeted removal of materials using chemical substances in semiconductor manufacturing. DAS Environmental Experts reliably treats the fluorine-containing waste gases produced during this process using ESCAPE, TILIA and STYRAX systems based on burn-wet technology.
CVD – Chemical Vapor Deposition
Chemical vapour deposition (CVD) involves chemical reactions that produce thin layers on substrates, e.g. made of silicon nitride or polysilicon. DAS Environmental Experts offers efficient systems such as ESCAPE, TILIA, UPTIMUM, STYRAX and LARCH for the safe waste gas treatment of these CVD and MOCVD processes.
Burn-Wet Technology for Safe Waste Gas Treatment
The compact burn-wet combination from DAS Environmental Experts is based on decades of experience in waste gas treatment. Process gases are oxidised, reduced or pyrolysed in a reactor with a burner, depending on their composition. Subsequent wet scrubbing reliably cools and binds the resulting compounds. Depending on the DAS abatement system, the process design may differ.
This point-of-use technology enables the safe and efficient treatment of industrial waste gases – including those containing fluorine compounds, ammonia, silane or hydrogen – and is used worldwide in the semiconductor industry.
Optimize your Waste Gas Treatment with ESCAPE DUO
Rely on dependable burn-wet technology – individually configurable for your production requirements.
