TILIA – Dual Reac­tor Sys­tem with Inter­nal Redundancy

TILIA is a Burn-Wet Sys­tem for advan­ced Etch and CVD appli­ca­ti­ons in the semi­con­duc­tor industry.

Was­te Gas Tre­at­ment – TILIA

Dis­po­sal of pyro­pho­ric, fluo­ri­na­ted, toxic or long-lived envi­ron­men­tal­ly harmful gases and reac­tion products

TILIA is a sys­tem for the dis­po­sal of pyro­pho­ric, fluo­ri­na­ted, toxic or long-lived envi­ron­men­tal­ly harmful gases and reac­tion pro­ducts which are used in che­mi­cal and phy­si­cal pro­ces­ses in the semi­con­duc­tor and solar indus­try or are gene­ra­ted by the pro­cess. Dis­po­sal takes place via com­bus­ti­on and sub­se­quent scrub­bing of par­tic­les, as well as absorp­ti­on of solu­b­le gas com­pon­ents with the aid of a scrub­bing liquid.


TILIA DUO is a dual reac­tor sys­tem with inter­nal red­un­dan­cy. It con­ta­ins two inde­pen­dent TILIA units, each con­sis­ting of a com­bi­na­ti­on of one com­bus­ti­on cham­ber and one scrub­ber with an inte­gra­ted demis­ter loca­ted abo­ve it. The­re is one power dis­tri­bu­ti­on box per side. In the maxi­mum con­fi­gu­ra­ti­on, each unit has six inlets for was­te gas as well as six other inlets which are con­nec­ted to the respec­ti­ve other TILIA unit via back-up lines. If neces­sa­ry, the was­te gas at the inlets of one of the two units can be diver­ted to the other unit. As a result, the sys­tem has inter­nal red­un­dan­cy and thus very high availability.

Func­tio­ning prin­ci­ple of the TILIA DUO with 4+4 inlets per reactor

Com­bus­ti­on Reactor

The was­te gas is fed into the com­bus­ti­on reac­tor and bur­ned the­re with the help of fuel gas and an oxi­dising agent. The bur­ner is usual­ly ope­ra­ted with a mix­tu­re of fuel gases (pro­pa­ne, natu­ral gas) and oxy­gen or com­pres­sed dry air. Due to its design, the was­te gas flows through the com­bus­ti­on reac­tor from top to bot­tom. The fla­me ener­gy cau­ses the che­mi­cal bonds to break apart. The decom­po­si­ti­on pro­ducts oxi­dise in the fla­me and form che­mi­cal­ly sta­ble compounds.

Quench Zone

A quench zone is added for fas­ter coo­ling of the gas after dischar­ge from the com­bus­ti­on reac­tor. Here the gas is coo­led down signi­fi­cant­ly in order to avo­id recom­bi­na­ti­on of the com­bus­ti­on pro­ducts and to redu­ce the tem­pe­ra­tu­re of the exhaust gas befo­re the fol­lo­wing pro­cess step.


The com­bus­ted was­te gas flows through the scrub­ber accor­ding to the coun­ter flow prin­ci­ple. The­re are seve­ral spray nozz­les and a demis­ter in the scrub­ber. Scrub­bing liquid is spray­ed into the gas stream with the spray nozz­les. During washing, par­tic­les are sus­pen­ded in the scrub­bing liquid and aci­dic com­pon­ents are neu­tra­li­sed by a basic scrub­bing liquid.


In the demis­ter, the water dro­p­lets are sepa­ra­ted on the sur­face of the fil­ling mate­ri­als. The sepa­ra­ted water enters the scrub­bing liquid tank.

Scrub­bing Liquid Tank and Recir­cu­la­ti­on loop

A scrub­bing liquid tank is loca­ted below the bur­ner and scrub­ber and ser­ves as a coll­ec­tion tank for the scrub­bing liquid. The liquid used is water, to which lye can be added, depen­ding on the design. The scrub­bing liquid is cir­cu­la­ted in a recir­cu­la­ti­on loop and has many func­tions here. It absorbs solu­b­le gas com­pon­ents in the scrub­ber and cools the system.

Operation Principal TILIA-DUO 4+4 NoSensors

TILIA – for advan­ced Etch and CVD applications


  • CVD / Etch (Metal, Poly, Oxi­des, …) / Epi­ta­xy / GaN / MOCVD / LED, …


  • To meet the need of incre­asing pro­cess gas flows
    Hig­her wafer through­put per aba­te­ment foot­print
     One TILIA replaces seve­ral pre­vious aba­te­ment systems.
  • To meet the incre­asing com­ple­xi­ty of Etch and CVD main­frames
     Com­bi­na­ti­on of CVD and Etch chambers

Basic Fea­tures

  • Burn-/Wet Sys­tem (Scrub­ber) with liquid recirculation
  • Ser­ves up to 8 or 12 pro­cess cham­bers with 
    • Up to 2400 slm total flow
    • Best in class capa­ci­ty per footprint
    • With cost effec­ti­ve inte­gra­ted backup
    • Reac­tor capa­ci­ty up to 1200 slm inert gas (per reactor)
  • Imple­men­ta­ti­on of safe­ty requi­re­ments of new pro­ces­ses with 
    • Hig­her num­ber of pro­cess modules
    • Lar­ger pro­cess gas flows
    • Hig­her total flows
TILIA-DUO 4+4 front-right open


TILIA-DUO 6+6 front-right open


Tech­ni­cal Data

Pump down capacity:3000 slm (8 inlets)3000 slm (12 inlets)
Bur­ner power (tunable):2 x 100 kW2 x 100 kW
Inlets:8 x DN40 with inter­nal redundancy12 x DN40 with inter­nal redundancy
Uptime:> 99.9%> 99.9%
Dr. Chris­ti­an Kuhne

Con­sul­ting and Tech­no­lo­gy Selection

The sel­ec­tion of the appro­pria­te tech­no­lo­gy is car­ri­ed out by our appli­ca­ti­on spe­cia­lists after ana­ly­zing the situa­ti­on on site. Infor­ma­ti­on about the pro­cess tool, vacu­um pump, gas types and flows as well as the available ope­ra­ting mate­ri­als are decisive.

In order to ensu­re a long-term run­time and tool avai­la­bi­li­ty, our ser­vice and tech­ni­cal sup­port are available on demand or on-site as soon as the sys­tem is commissioned.

Dr. Chris­ti­an Kuhne

Direc­tor Sales Global