Burn-Dry Systems – Efficient, Safe and Low-Emission Waste Gas Treatment

Point-of-Use Systems for MOCVD and EUV Processes– no Wastewater, Low Fuel Gas Consumption and High Operational Reliability.

Overview

The burn-dry process offers a particularly reliable and sustainable point-of-use solution for waste gas treatment in processes with high hydrogen and ammonia loads, as well as lower levels of organometallic compounds and silane. It is therefore ideally suited to the treatment of waste gases from MOCVD, LED, µLED, GaN and EUV processes.

The image shows a large white industrial machine labeled with "LARCH" and a "DAS" logo, featuring a control panel, indicator lights, and multiple compartments, representing the 'LARCH PLUS by DAS EE’ system.

LARCH

Thanks to the robust burn-dry principle, the LARCH product family operates with exceptional stability, requires minimal maintenance and has very low running costs. As it operates without fresh water, no wastewater is produced, unlike with wet scrubbers. At the same time, pollutant pyrolysis or staged combustion ensures a significant reduction in NOx formation, making the process one of the cleanest and most efficient technologies in its class.